AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made
Aluminium-Tantalum
Lipheo li lokisoa ka ho kopanya Aluminium le Tantalum powders kapa vacuum melting e lateloang ke ho kopanya ho fihlela boima bo feletseng.Thepa e kopantsoeng ka tsela eo e ka sireloa ka boikhethelo ebe e etsoa sebopeho sa sepheo se lakatsehang.
Aluminium Tantalum sputtering target e na le bohloeki bo phahameng, microstructure e homogeneous le conductivity e babatsehang.E sebelisoa haholo ha ho etsoa lifilimi tse tšesaane bakeng sa indasteri ea ponts'o e bataletseng.Aluminium Tantalum e ka boela ea eketsoa ho hlahisa ts'ebetso e phahameng ea Titanium alloy ho ntlafatsa boleng ba eona ba mocheso o phahameng.
Lintho tse sa hloekang tsa Al-Ta alloy
tlhamo | Litaba(%) | ||||
Ta | Fe | Si | C | O | |
AlTa60 | 55.0~65.0 | ≤0.05 | ≤0.02 | ≤0.01 | ≤0.05 |
AlTa70 | 65.0~75.0 | ≤0.05 | ≤0.02 | ≤0.01 | ≤0.05 |
Rich Special Materials e sebetsa ka ho khetheha ho Tlhahiso ea Sputtering Target mme e ka hlahisa Lisebelisoa tsa Aluminium Tantalum Sputtering ho latela litlhaloso tsa Bareki.Lihlahisoa tsa rona li na le thepa e ntle ea mochini, sebopeho se ts'oanang, bokaholimo bo bentšitsoeng bo se nang karohano, li-pores kapa mapetsong.Ho fumana lintlha tse ling, ka kopo ikopanye le rona.