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CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom E entsoe

Cobalt Chromium Tantalum

Tlhaloso e Khutšoanyane:

Sehlopha

Sepheo sa Alloy Sputtering

Foromo ea Lik'hemik'hale

CoCrTa

Sebopeho

Cobalt Chromium Tantalum

Bohloeki

99.9%, 99.95%, 99.99%

Sebopeho

Lipoleiti, Lipehelo tsa Kholomo, li-arc cathodes, tse entsoeng ka mokhoa o ikhethileng

Mokhoa oa Tlhahiso

Ho qhibiliha ha Vacuum

Boholo bo fumanehang

L≤200mm, W≤200mm


Lintlha tsa Sehlahisoa

Li-tag tsa Sehlahisoa

Cobalt Chromium Tantalum sputtering target e etsoa ka mokhoa oa ho lahla le ho qhibiliha ha vacuum.mme ebe di boptjwa ho ba sebopeho se batloang.E na le bohloeki bo phahameng le homogenous microstructure.Co-Cr-Ta e kile ea e-ba sesebelisoa sa bohlokoa bakeng sa ho rekota matla a khoheli bakeng sa thepa ea eona ea khoheli: matla a phahameng, thepa ea lerata le tlase le lisekoere tse ntle haholo.

Rich Special Materials e sebetsa ka ho khetheha ho Tlhahiso ea Sputtering Target mme e ka hlahisa Cobalt Chromium Tantalum Sputtering Materials ho latela litlhaloso tsa Bareki.Ho fumana lintlha tse ling, ka kopo ikopanye le rona.


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