Melemo le melemo ea theknoloji ea ho roala sputtering

Haufinyane tjena, basebelisi ba bangata ba botsitse ka melemo le melemo ea theknoloji ea ho roala sputtering, Ho ea ka litlhoko tsa bareki ba rona, hona joale litsebi tse tsoang Lefapheng la Theknoloji la RSM li tla arolelana le rona, ka tšepo ea ho rarolla mathata.Mohlomong ho na le lintlha tse latelang:

　　1. Ho se leka-lekane ha magnetron sputtering

Ho nka hore matla a khoheli a fetang ka hare le ka ntle lipheletsong tsa magnetron sputtering cathode ha a lekane, ke cathode e sa leka-lekaneng ea magnetron sputtering.Matla a makenete a cathode e tloaelehileng ea magnetron sputtering e tsepamisitsoe haufi le moo ho shebiloeng teng, ha matla a khoheli a sa leka-lekaneng a sputtering cathode a tsoa ho sepheo.Matla a khoheli a cathode a tloaelehileng a magnetron a thibela ka thata plasma haufi le sebaka se shebiloeng, athe plasma e haufi le substrate e fokola haholo, 'me karoloana e ke ke ea hlaseloa ke li-ion tse matla le lielektrone.The non-equilibrium magnetron cathode magnetic field e ka atolosa plasma hole le sebaka se lebeletsoeng mme ea qoelisa substrate.

　　2、 Maqhubu a seea-le-moea (RF) sputtering

Molao-motheo oa ho kenya filimi e sireletsang: monyetla o mobe o sebelisoa ho mokhanni o behiloeng ka morao ho sepheo sa ho sireletsa.Polasemang e ntšang khanya, ha poleiti e positi ea ion e potlakisa, e hlasela sepheo sa eona se sireletsang ka pel'a sona ho fafatsa.Sputtering ena e ka nka metsotsoana e 10-7 feela.Ka mor'a moo, bokhoni bo botle bo entsoeng ke tefiso e ntle e bokelitsoeng holim'a sepheo sa insulating e fokotsa bokhoni bo bobe holim'a poleiti ea conductor, kahoo ho emisoa ha bombardment ea li-ion tse nang le matla a phahameng ho sepheo sa insulating.Ka nako ena, haeba polarity ea phepelo ea motlakase e khutlisetsoa morao, lielektrone li tla otla poleiti ea insulate le ho fokotsa tefiso e ntle holim'a poleiti e sireletsang nakong ea metsotsoana e 10-9, ho etsa hore e be lefela.Ka nako ena, ho khutlisa polarity ea phepelo ea motlakase ho ka hlahisa sputtering bakeng sa metsotsoana e 10-7.

Melemo ea RF sputtering: lipehelo tsa tšepe ka bobeli le lipehelo tsa dielectric li ka ts'oaroa.

　　3, DC magnetron sputtering

Thepa ea magnetron sputtering coating e eketsa matla a khoheli sebakeng sa DC sputtering cathode target, e sebelisa matla a Lorentz a matla a khoheli ho tlama le ho atolosa tsela ea lielektrone tšimong ea motlakase, e eketsa monyetla oa ho thulana pakeng tsa lielektrone le liathomo tsa khase, Sekhahla sa ionization ea liathomo tsa khase, se eketsa palo ea li-ion tse nang le matla a phahameng tse hlaselang sepheo le ho fokotsa palo ea li-electrone tse nang le matla a phahameng tse hlaselang karolo e ka tlas'a lefatše.

Melemo ea planar magnetron sputtering:

1. Sepheo sa matla a matla a matla a ka fihla ho 12w / cm2;

2. Sepheo sa motlakase se ka fihla ho 600V;

3. Khatello ea khase e ka fihla ho 0.5pa.

Mefokolo ea sputtering ea planar magnetron: sepheo se theha mocha oa sputtering sebakeng sa sefofane, ho phunyeha ha sebaka sohle sa sepheo ha se lekane, 'me tekanyo ea tšebeliso ea sepheo ke 20% - 30% feela.

　　4, maqhubu a mahareng a AC magnetron sputtering

E bolela hore ka har'a lisebelisoa tsa AC magnetron sputtering tse mahareng, hangata lipheo tse peli tse nang le boholo bo lekanang le sebopeho li hlophisoa ka lehlakore, hangata li bitsoa liphofu tse peli.Ke lisebelisoa tse emisitsoeng.Hangata, lipheo tse peli li tsamaisoa ka nako e le 'ngoe.Ts'ebetsong ea maqhubu a mahareng a maqhubu a AC magnetron reactive sputtering, liphofu tse peli li sebetsa joalo ka anode le cathode ka ho latellana, 'me li sebetsa joalo ka anode cathode e mong ka halofo ea potoloho e tšoanang.Ha sepheo se le boemong bo bobe ba halofo ea potoloho, sebaka seo ho lebeletsoeng ho sona se hlaseloa le ho hasoa ke li-ion tse ntle;Karolong e ntle ea halofo ea potoloho, lielektrone tsa plasma li potlakisetsoa sebakeng seo ho shebiloeng ho sona ho fokotsa tefiso e ntle e bokelletsoeng sebakeng se sireletsang sebaka seo ho shebiloeng ho sona, e seng feela ho hatella ho chesoa ha sebaka seo ho shebiloeng ho sona, empa hape le ho felisa ketsahalo ea " ho nyamela ha anode".

Melemo ea intermediate frequency double target reactive sputtering ke:

(1) Sekhahla se phahameng sa deposition.Bakeng sa lipehelo tsa silicon, sekhahla sa deposition sa medium frequency reactive sputtering ke makhetlo a 10 ho feta a DC reactive sputtering;

(2) Ts'ebetso ea sputtering e ka tsitsisoa sebakeng sa ts'ebetso se behiloeng;

(3) Ketsahalo ea "ho khantša" e felisitsoe.Sekhahla sa sekoli sa filimi e lokiselitsoeng ea insulating ke litaelo tse 'maloa tsa boholo bo ka tlase ho mokhoa oa DC reactive sputtering;

(4) Mocheso o phahameng oa substrate o molemo ho ntlafatsa boleng le ho khomarela filimi;

(5) Haeba phepelo ea motlakase e le bonolo ho lumellana le sepheo ho feta phepelo ea motlakase ea RF.

　　5. Reactive magnetron sputtering

Ts'ebetsong ea sputtering, khase ea reaction e feptjoa ho itšoara le likaroloana tse sputtered ho hlahisa lifilimi tse kopantsoeng.E ka fana ka khase e sebetsang ho sebetsana le sepheo sa motsoako oa sputtering ka nako e le 'ngoe,' me e ka boela ea fana ka khase e sebetsang ho itšoara ka tšepe ea sputtering kapa alloy target ka nako e le 'ngoe ho lokisetsa lifilimi tse kopantsoeng ka karolelano ea lik'hemik'hale tse fanoeng.

Melemo ea lifilimi tse sebetsang tsa magnetron sputtering:

(1) Lisebelisoa tse lebisitsoeng le likhase tse sebetsang tse sebelisoang ke oksijene, naetrojene, li-hydrocarbon, joalo-joalo, tseo hangata ho leng bonolo ho li fumana lihlahisoa tse hloekileng, tse thusang ho lokisoa ha lifilimi tse nang le bohloeki bo phahameng;

(2) Ka ho fetola mekhoa ea ts'ebetso, lifilimi tsa lik'hemik'hale kapa tse se nang lik'hemik'hale li ka lokisoa, e le hore litšobotsi tsa lifilimi li ka fetoloa;

(3) Mocheso oa mocheso oa substrate ha o phahame, 'me ho na le lithibelo tse fokolang ho substrate;

(4) E loketse ho roala junifomo ea sebaka se seholo mme e hlokomela tlhahiso ea indasteri.

Nakong ea ts'ebetso ea magnetron sputtering, ho se tsitse ha motsoako oa sputtering ho bonolo ho etsahala, haholo-holo ho kenyelletsa:

(1) Ho thata ho lokisetsa lipakane tse kopanetsoeng;

(2) Ketsahalo ea ho otla ha arc (arc discharge) e bakoang ke chefo ea sepheo le ho se tsitse ha mokhoa oa sputtering;

(3) Sekhahla se tlase sa sputtering;

(4) Bophahamo ba sekoli ba filimi bo phahame.